"The Interface Challenge - Mastering Interfaces in Railway Operation and Planning"

The third edition of a noted series of rail conferences in Zurich IT10.rail will be held on 21-23 January 2010. Its organisers are motivated by the success of the previous events in 2005 and 2008, which attracted about 300 experts and decision-makers each. The Swiss Federal Institute of Technology (ETH) in Zurich will again be the venue. Four Swiss organisations are collectively organising the three-day international conference: ETH's Institute for Transport Planning and Systems, SMA und Partner AG and OpenTrack Railway Technology GmbH all based in Zurich  and systransis AG of Zug.

More and more stakeholders of the railway industry become aware of the fact that the better usage of the existing infrastructure, time table stability issues as well as pressure to save energy all ask for new solutions to optimisation of the train traffic.

In this second edition  of the systransis Atelier, we would like to deepen the insights into the opportunities and challenges of optimising  the railway traffic and the related operational processes.

The goal of this atelier is to provide a forum for the interactive discussion of the different dimensions of Rescheduling and Train Traffic Optimisation.

The SMA Colloquium offers participants a platform for topics and questions revolving around service and operations planning in railway transport. In the colloquium sessions, SMA specialists and noted outside experts will present a variety of projects and innovative approaches and solutions.

OpenTrack is a railway simulation tool developed at the ETH Zurich. It is a catalyst for practical economic solutions to complex railway technology problems.

During the user workshop you will receive first-hand information about new functions and the latest development around the Viriato product. Furthermore this platform represents an excellent possibility for users and developers to exchange experience and know-how with colleagues and to discuss ideas and visions for future requirements in various areas of application.